Zinc tin oxide metal semiconductor field effect transistors and their improvement under negative bias (illumination) temperature stress

Type of content
Journal Article
Thesis discipline
Degree name
Publisher
AIP Publishing
Journal Title
Journal ISSN
Volume Title
Language
en
Date
2017
Authors
Dang, Giang
Kawaharamura T
Furuta M
Allen, Martin
Abstract

© 2017 Author(s). Metal-semiconductor-field-effect-transistors (MESFETs) with silver oxide Schottky gates on zinc tin oxide (ZTO) channels showed fundamental differences in stability compared to conventional amorphous-oxide semiconductor thin-film-transistors (AOS-TFTs). The most severe negative-bias-temperature and negative-bias-illumination-temperature stress conditions, which usually degrade the performance of AOS-TFTs, significantly improved the switching characteristic of these ZTO MESFETs, producing devices with on:off current ratios, mobilities, and subthreshold swings of 8 × 106, 12 cm2 V−1 s−1, and 180 mV/dec, respectively. Further analysis confirmed that both negative bias and temperature (65 °C) were simultaneously required to produce this permanent effect that was linked to the electromigration of ionized donors from the MESFET depletion-region.

Description
Citation
Dang GT, Kawaharamura T, Furuta M, Allen MW (2017). Zinc tin oxide metal semiconductor field effect transistors and their improvement under negative bias (illumination) temperature stress. Applied Physics Letters. 110(7). 073502-073502.
Keywords
Ngā upoko tukutuku/Māori subject headings
ANZSRC fields of research
40 - Engineering::4009 - Electronics, sensors and digital hardware::400904 - Electronic device and system performance evaluation, testing and simulation
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All rights reserved unless otherwise stated