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    Multilevel Nanoengineering for Imprint Lithography

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    Author
    Konijn, Mark
    Date
    2005
    Permanent Link
    http://hdl.handle.net/10092/1071
    Thesis Discipline
    Electrical Engineering
    Degree Grantor
    University of Canterbury
    Degree Level
    Masters
    Degree Name
    Master of Engineering

    The current trend in pushing photo lithography to smaller and smaller resolutions is becoming increasingly difficult and expensive. Extreme ultra-violet lithography is an alternate method that has the potential to provide feature sizes down to 30 nm, however, it will come at an even greater cost. Nanoimprint lithography (NIL) is another lithographic technique which is promising to provide very high resolutions at a relatively low cost. Imprinting works by using a mold with a surface patterned with the required nano structures and pressing it into a substrate coated with a deformable polymer. Due to its direct pattern replication technique, it is very capable of reproducing three-dimensional structures, however limited research has been performed on this to date. In this study, investigations have been performed into developing a reliable process for creating SiN molds with sub-100 nm structures with variable height control. The process relies on a negative tone electron beam resist which can be patterned to various thicknesses by varying the exposure dosage. This allows for the creation of complex multi-layer structures in a single electron beam lithography step. These patterns then have been transferred into the SiN substrate by a single reactive ion etch. From here the mold is ready for use in imprinting. Study has also been performed into imprinting process as well. This includes the development of an imprint press, the manner in which NIL works. Investigations have been performed into the imprinting performance of 3D molds. Thermal expansion issues have been found and addressed, as have adhesion problems. Some other aspects of 3D NIL which have not been addressed in this study have been outlined in future work for further investigation.

    Subjects
    Nanoimprint
     
    lithography
     
    embossing
     
    imprint
     
    three dimensional
     
    SEM
     
    scanning electron microscope
     
    EBL
     
    electron beam
     
    mold
     
    silicon nitride
     
    EUV
     
    low cost lithography
    Collections
    • Engineering: Theses and Dissertations [2155]
    Rights
    http://library.canterbury.ac.nz/thesis/etheses_copyright.shtml

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