Uniform molecular flux in a vertical reactor with pulsed transition regime gas flow
dc.contributor.author | Krumdieck, S. | |
dc.contributor.author | Lee, J-Y. | |
dc.contributor.author | Raatz, H. | |
dc.date.accessioned | 2007-07-26T23:18:34Z | |
dc.date.available | 2007-07-26T23:18:34Z | |
dc.date.issued | 2003 | en |
dc.description.abstract | Pulsed-CVD technology accomplishes reactant delivery by timed injection of gas into a continuously evacuated reactor. The reactor conditions produced by this method are new to CVD processing. Seminal investigations to characterize the flow dynamics and transport phenomena for pulsed-transition regime flow are reported. Non-dimensional parameters for reactor design and process control are proposed, and the theory describing molecular impingement rate as a function of these parameters is presented. An experimental, industrial-scale reactor and experimental methods, including naphthalene sublimation, have been developed to investigate the flow dynamics. Pulses of known volume and pressure N2 were delivered into the reactor at timed intervals, while monitoring the resulting reactor pressure and molecular flux field. Results demonstrate that uniform molecular flux can be achieved by Pulsed-CVD at pressures where steady flow would result in stable boundary layers, and thus non-uniform heat and mass transport fields at the substrate, and throughout the reactor. | en |
dc.identifier.citation | Krumdieck, S., Lee, J-Y., Raatz, H. (2003) Uniform molecular flux in a vertical reactor with pulsed transition regime gas flow. Electrochemical Society Proceedings, CVD-XVI/EUROCVD-14 2003-08 (Paris, France, April 27th- May 2nd 2003) 179-185. | en |
dc.identifier.uri | http://hdl.handle.net/10092/297 | |
dc.language.iso | en | |
dc.publisher | University of Canterbury. Mechanical Engineering. | en |
dc.rights.uri | https://hdl.handle.net/10092/17651 | en |
dc.subject | Pulsed-CVD | en |
dc.subject | Process Control | en |
dc.subject | Unsteady Flow Dynamics | en |
dc.subject | Process Technology | en |
dc.subject | CVD System Design | en |
dc.subject.marsden | Fields of Research::290000 Engineering and Technology::290500 Mechanical and Industrial Engineering::290501 Mechanical engineering | en |
dc.title | Uniform molecular flux in a vertical reactor with pulsed transition regime gas flow | en |
dc.type | Conference Contributions - Other |
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