Fabrication of Dye Sensitized Solar Cells on Pre-textured Substrates (2010)
Type of ContentTheses / Dissertations
Thesis DisciplineElectrical Engineering
Degree NameMaster of Engineering
PublisherUniversity of Canterbury. Electrical and Computer Engineering
AuthorsChen, Linda Yen-Chienshow all
Dye Sensitized Solar Cells (DSSC) possesses huge potential in solar energy utilisation and immense research has been carried out in order to improve its performance. There are several aspects that affect the solar cell’s performance, such as the photon collection efficiency of the cell, the reflectivity of the semiconductor, the transparency and conductivity of the transparent conductive oxide layer, and the photon-electron conversion efficiency. In this research, a pre-patterned substrate was used as a base to fabricate DSSC for improving the photon collection efficiency of DSSC. The pre-patterned substrate was prepared using maskless dry etching technique, resulting in micro-size features on the substrates and giving a 1% reduction on reflectance. The effect of Aluminium doped ZnO sputtered as the Transparent Conductive Oxide layer (TCO) in comparison with a typical DSSC fabricated on Tin doped Indium Oxide glass (ITO) was also studied. The research was carried out in two parts: substrate texturing of glass fabrication with Al:ZnO deposition, and DSSC cell assembly. The first half was carried out in the nanofabrication laboratory at University of Canterbury, New Zealand, and the second half was in National Nano Device Laboratory, Taiwan. The characteristics of both the substrates and the cells were measured using spectrophotometer with integrating sphere and solar cell simulation system. Decrease in reflectance of the Al:ZnO coated substrate at infrared region from 20% to 10 % was achieved. Due to the high resistivity of Al:ZnO and the problem of incapability in TiO2 coating, DSSC cells fabricated with these substrates have efficiencies around 2%, which is lower than the typical DSSC cells fabricated with ITO glass. Future adjustments on the substrate etching process and the cell assembly are needed for optimizing the results. The relatively high resistivity of Al:ZnO also needs to be lower for better DSSC cell performance.