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Multilevel Nanoengineering for Imprint Lithography
(University of Canterbury. Electrical and Computer Engineering, 2005)
The current trend in pushing photo lithography to smaller and smaller resolutions is becoming increasingly difficult and expensive. Extreme ultra-violet lithography is an alternate method that has the potential to provide ...
Distortion in conformable masks for evanescent near field optical lithography
(University of Canterbury. Electrical and Computer Engineering, 2007)
In this thesis the in-plane pattern distortion resulting from the use of Evanescent Near Field Optical Lithography (ENFOL) masks was investigated. ENFOL is a high resolution low-cost technique of lithography that is able ...