Three dimensional HSQ structures formed using multiple low energy electron beam lithography (2006)
Type of ContentJournal Article
PublisherUniversity of Canterbury. Physics and Astronomy.
University of Canterbury. Electrical and Computer Engineering.
AuthorsBoyd, E.J., Blaikie, R.J.show all
A method is presented for the fabrication of three-dimensional (3D) structures formed in Hydrogen Silsequioxane (HSQ) by a process of multiple low energy electron beam exposures with a single development step. Structures have been produced consisting of multiple layers of dielectric rods with widths and heights of 150nm and a separation of 1μm in the horizontal plane and 360nm in the vertical direction.
CitationBoyd, E.J., Blaikie, R.J. (2006) Three dimensional HSQ structures formed using multiple low energy electron beam lithography. Microelectronic Engineering, 83(4-9), pp. 767-770.
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