Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing

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Conference Contributions - Published
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Publisher
University of Canterbury. Mechanical Engineering.
Journal Title
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Date
2006
Authors
Cave, H.M.
Krumdieck, S.
Jermy, M.C.
Abstract

A model of the movement of precursor particles in the unsteady Pulsed-Pressure Chemical Vapour Deposition (PP-CVD) process is developed to study the high conversion efficiencies observed experimentally in this process. Verification of the modelling procedures was conducted through a study of velocity persistence in an equilibrium gas and through Direct Simulation Monte Carlo (DSMC) simulations of unsteady self-diffusion processes. The model results demonstrate that in the PP-CVD process the arrival time for precursor particles at the deposition surface is much less than the reactor pump-down time, resulting in high precursor conversion efficiencies. Higher conversion efficiency was found to correlate with smaller size solvent molecules and moderate reactor peak pressure.

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Citation
Cave, H.M., Krumdieck, S.P. Jermy, M.C. (2006) Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing. Christchurch, New Zealand: Process Intensification and Innovation Process (PI2) Conference II, 24-29 Sep 2006.
Keywords
Pulsed pressure chemical vapour deposition (PP-CVD), Precursor conversion efficiency, Diffusion, DSMC, Process modelling
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