Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing (2006)
AuthorsCave, H.M., Krumdieck, S., Jermy, M.C.show all
A model of the movement of precursor particles in the unsteady Pulsed-Pressure Chemical Vapour Deposition (PP-CVD) process is developed to study the high conversion efficiencies observed experimentally in this process. Verification of the modelling procedures was conducted through a study of velocity persistence in an equilibrium gas and through Direct Simulation Monte Carlo (DSMC) simulations of unsteady self-diffusion processes. The model results demonstrate that in the PP-CVD process the arrival time for precursor particles at the deposition surface is much less than the reactor pump-down time, resulting in high precursor conversion efficiencies. Higher conversion efficiency was found to correlate with smaller size solvent molecules and moderate reactor peak pressure.
CitationCave, H.M., Krumdieck, S.P. Jermy, M.C. (2006) Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing. Christchurch, New Zealand: Process Intensification and Innovation Process (PI2) Conference II, 24-29 Sep 2006.
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