Using surface-plasmon effects to improve process latitute in near-field optical lithography (2006)
Type of ContentConference Contributions - Published
PublisherUniversity of Canterbury. Electrical and Computer Engineering.
AuthorsArnold, M.D., Blaikie, R.J.show all
Surface Plasmon Enhanced Contact Lithography uses an underlying plasmonic layer to enhance image quality in Evanescent Near-Field Optical Lithography. This article details simulations aimed at finding optimum conditions and attempts to explain some underlying mechanisms. Parameters explored include resist thickness, metal permittivity and thickness, polarization, and grating period and duty-cycle.
CitationArnold, M.D., Blaikie, R.J. (2006) Using surface-plasmon effects to improve process latitute in near-field optical lithography. Brisbane, Australia: 2006 International Conference on Nanoscience and Nanotechnology (ICONN 2006), 3-7 Jul 2006. Proceedings International Conference on Nanoscience and Nanotechnology 2006, 548-551.
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