Now showing items 1-4 of 4
Improving imaging performance in planar superlenses
(University of Canterbury. Department of Electrical and Computer Engineering, 2011)
The aim of this project was to improve the imaging performance of planar superlenses for evanescent near-field lithography. An experimental investigation of the performance of superlenses with reduced surface roughness ...
Planar Lensing Lithography: Enhancing the Optical Near Field.
(University of Canterbury. Electrical and Computer Engineering, 2006)
In 2000, a controversial paper by John Pendry surmised that a slab of negative index material could act as a perfect lens, projecting images with resolution detail beyond the limits of conventional lensing systems. A ...
Multilevel Nanoengineering for Imprint Lithography
(University of Canterbury. Electrical and Computer Engineering, 2005)
The current trend in pushing photo lithography to smaller and smaller resolutions is becoming increasingly difficult and expensive. Extreme ultra-violet lithography is an alternate method that has the potential to provide ...
Distortion in conformable masks for evanescent near field optical lithography
(University of Canterbury. Electrical and Computer Engineering, 2007)
In this thesis the in-plane pattern distortion resulting from the use of Evanescent Near Field Optical Lithography (ENFOL) masks was investigated. ENFOL is a high resolution low-cost technique of lithography that is able ...