Browsing College of Engineering by Subject "Ultra high Numerical Aperture"
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High Aspect Ratio Lithographic Imaging at Ultra-high Numerical Apertures: Evanescent Interference Lithography with Resonant Reflector Underlayers (University of Canterbury. Electrical and Computer Engineering, 2012)A near-field technique known as evanescent interferometric lithography allows for high resolution imaging. However its primary limitation is that the image exponentially decays within the photoresist due to physical limits. ...